https://www.selleckchem.com/pr....oducts/sodium-l-asco
X-ray photoelectron spectroscopy (XPS) has been used to study the effect of mixed H2O/H2 gas plasma on the surfaces of UO2, U2O5 and UO3 thin films at 400 °C. The experiments were performed in situ under ultra-high vacuum conditions. Deconvolution of the U4f7/2 peaks into U(iv), U(v) and U(vi) components revealed the surface composition of the films after 10 min plasma exposure as a function of H2 concentration in the feed gas of the plasma. Some selected films (unexposed and exposed) were also analysed using grazi
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