https://www.selleckchem.com/pr....oducts/mk-8353-sch90
HfO2 and ZrO2 have increasingly drawn the interest of researchers as lead-free and silicon technology-compatible materials for ferroelectric, pyroelectric, and piezoelectric applications in thin films such as ferroelectric field-effect transistors, ferroelectric random access memories, nanoscale sensors, and energy harvesters. Owing to the environmental regulations against lead-containing electronic components, HfO2 and ZrO2 offer, along with AlN, (K,Na)NbO3- and (Bi0.5Na0.5)TiO3-based materials, an alternative to Pb(ZrxTi1-x)
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