https://www.selleckchem.com/products/sant-1.html
When nanoimprint serves as a lithography process, it is most attractive for the ability to overcome the typical residual layer remaining without the need for etching. Then, 'partial cavity filling' is an efficient strategy to provide a negligible residual layer. However, this strategy requires an adequate choice of the initial layer thickness to work without defects. To promote the application of this strategy we provide a 'guiding chart' for initial layer choice. Due to volume conservation of the imprint polymer this guiding chart has t
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