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Plasma modification of transition metal nitride/oxynitride (MOxNy) surfaces for enhanced surface properties is highly desirable, given the scalability of such methods and limitations of thermal treatments. In situ x-ray excited photoelectron spectroscopy demonstrates that the O2 plasma oxidation of VOxNy films generates non-lattice N1s surface features with binding energies near 396.5 eV, which are associated with the nitrogen reduction reaction activity but not observed upon thermal oxidation. The NH3 plasma generates N1s surface featu
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