https://www.selleckchem.com/products/nd-630.html
UV-H2O2 is the most widely used oxidizing system with established effectiveness and a high level of technical development for practical application. However, little attention was paid on the effect of suspended particles in natural water on organic contaminants removal via UV-H2O2 technique. In this study, this effect of suspended particles to enhance the contaminant degradation was explored using silica/alumina-based oxides (MCM-41 and Al@MCM-41) as the representative. The results showed that MCM-41 had no effect on OFX degradation comp
Like
Comment
Share
